MULTIVARIABLE DYNAMIC MODELING AND PLASMA-ORIENTED ADVANCED PROCESS CONTROL OF N

PHD THESIS

Autor: WÖLFEL, CHRISTIAN

Sección: TECNOLOGÍA - Otros libros de Tecnología

MULTIVARIABLE DYNAMIC MODELING AND PLASMA-ORIENTED ADVANCED PROCESS CONTROL OF N

150,00€ IVA INCLUIDO

Editorial:: DONOSTIARRA
Publicación:: 03/03/2021
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Sinopsis

This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from the plasma-physical side. The plasma behavior is explicitly considered for the process modeling and for the design of the control system to establish steady-state plasma conditions. By use of one of the presented control systems an unstable operation point of the process can be stabilized, which enables high deposition speed and a stoichiometric thin film subject to steady-state plasma conditions. In this framework, the plasma state is either defined by the self-bias voltage or the electron density. The application of the Multipole Resonance Probe allows to control the electron density as a quantity that directly characterizes the plasma state.

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CONTROL-ORIENTED MODELING AND FEEDBACK CONTROL OF REACTIVE SPUTTERING
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59,95€ IVA INCLUIDO

MULTIVARIABLE DYNAMIC MODELING AND PLASMA-ORIENTED ADVANCED PROCESS CONTROL OF N

Editorial:

DONOSTIARRA

Fecha Publicación:

03/03/2021

Formato:

Normal tapa blanda (libros)

ISBN:

978-3-7534-2484-2

EAN:

9783753424842

Nº páginas:

340

Colección:
Lengua:: ALEMAN
Alto:: 210 mm
Ancho:: 148 mm
Sección:: TECNOLOGÍA
Sub-Sección:: Otros libros de Tecnología

WÖLFEL, CHRISTIAN

Christian Woelfel is postdoctoral researcher at Ruhr University Bochum, Germany. In his work, he combines the fields of control engineering and plasma science to develop an advanced plasma-oriented control strategy for vacuum processes. His research interests are focused on the modeling and control of physical systems against the background of interdisciplinary research themes that include plasma-based processes, process instrumentation and control theory.